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Simultaneous optical measurements of electrical activity from multiple sites on processes of cultured neurons.

机译:对培养的神经元过程中多个位置的电活动进行同时光学测量。

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摘要

Optical methods using changes in fluorescence and absorption of voltage-sensitive dyes were developed to record electrical activity from processes of nerve cells grown in monolayer culture. For transmission measurements, a merocyanine dye was discovered but was more sensitive than others previously tested on cultured neurons. Action potentials from the somata of these cells were detected without averaging, with a signal-to-noise ratio of 20:1. With this dye, electrical responses were simultaneously recorded from many points along the arborization of neuroblastoma cells by using a 10 X 10 array of photodiodes positioned in the microscope image plane. Frequently different processes had different shapes of electrical responses, suggesting regional specializations. Fluorescence measurements with an oxonol dye proved to be more sensitive than transmission measurements, particularly when recording from small processes. By changing the position of the cell relative to a laser microbeam while recording electrically from the cell body, it was possible to monitor the membrane potential in the cell body and in the process simultaneously. From the delay in response in the process, a lower limit for the mean conduction velocity of 0.2-0.6 m/sec was found for 2- to 6- micrometers processes. The mean space constants of processes were estimated by comparing the amplitudes of passive voltage responses in the cell body and growth cone. A lower limit of 400-950 micrometers was obtained for 4- to 7-micrometers processes.
机译:开发了利用荧光变化和压敏染料吸收的光学方法来记录单层培养中生长的神经细胞过程的电活动。为了进行透射测量,发现了一种花菁染料,但比以前在培养的神经元上测试的其他染料敏感。没有平均地检测到这些细胞的体细胞的动作电位,信噪比为20:1。使用这种染料,通过使用位于显微镜图像平面中的10 X 10光电二极管阵列,沿着成神经细胞瘤细胞的树状排列同时记录了许多点的电响应。通常,不同的过程具有不同形状的电响应,这表明区域专业化。已证明,使用氧杂酚染料的荧光测量比透射测量更敏感,尤其是在小过程中进行记录时。通过在从电池体进行电记录的同时更改电池相对于激光微束的位置,可以同时监控电池体中和过程中的膜电位。从该过程的响应延迟中,发现2至6微米过程的平均传导速度的下限为0.2-0.6 m / sec。通过比较细胞体和生长锥中无源电压响应的幅度来估计过程的平均空间常数。对于4到7微米的工艺,下限为400-950微米。

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