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Fabrication of Highly Packed Plasmonic Nanolens Array Using Polymer Nanoimprinted Nanodots for an Enhanced Fluorescence Substrate

机译:使用聚合物纳米压印的纳米点增强荧光基板的高度堆积的等离子纳米透镜阵列的制作。

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摘要

A simple and cost-effective fabrication method for plasmonic nanolens arrays (PNA) with a narrow gap has been proposed for fabricating enhanced fluorescence substrates, in which the fluorophores interacting with the enhanced electromagnetic field generated by localized surface plasmons provide a higher fluorescence signal. The PNA was fabricated by the sequential depositions of the SiO2 and Ag layers on a UV-nanoimprinted nanodot array with a pitch of 500 nm, a diameter of 250 nm, and a height of 100 nm. During the deposition processes, the shape of the nanodots changed to that of nanolenses, and the gap between the nanolenses was decreased via sidewall deposition. To examine the feasibility of the fabricated PNA for enhanced fluorescence application, a streptavidin-Cy5 (SA-Cy5) conjugate dissolved in a saline buffer solution was spotted on the PNA, and the fluorescence signals of the SA-Cy5 were measured and compared with those on a bare glass substrate. The enhancement factor was affected by the gap between the nanolenses, and the maximum enhancement factor of ~128 was obtained from the PNA with a SiO2 layer thickness of 150 nm and an Ag layer thickness of 100 nm. Finally, an electromagnetic field analysis was used to examine the fluorescence signal enhancement, and was conducted using rigorous coupled wave analysis.
机译:已经提出了一种用于窄间隙等离子体纳米透镜阵列(PNA)的简单且经济高效的制造方法,用于制造增强型荧光基板,其中与局部表面等离子体激元产生的增强电磁场相互作用的荧光团可提供更高的荧光信号。通过在间距为500 nm,直径为250 nm,高度为100 nm的UV纳米压印纳米点阵列上依次沉积SiO2和Ag层来制造PNA。在沉积过程中,纳米点的形状变为纳米透镜的形状,并且通过侧壁沉积减小了纳米透镜之间的间隙。为了检查所制造的PNA增强荧光应用的可行性,将溶解在盐缓冲溶液中的链霉亲和素-Cy5(SA-Cy5)缀合物点在PNA上,然后测量SA-Cy5的荧光信号并与之比较。在裸露的玻璃基板上。增强因子受纳米透镜之间的间隙影响,SiO 2层厚度为150 nm,Ag层厚度为100 nm的PNA获得了约128的最大增强因子。最后,电磁场分析用于检查荧光信号的增强,并使用严格的耦合波分析进行。

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