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The UV Plasmonic Behavior of Distorted Rhodium Nanocubes

机译:扭曲的铑纳米立方体的紫外等离子体行为。

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摘要

For applications of surface-enhanced spectroscopy and photocatalysis, the ultraviolet (UV) plasmonic behavior and charge distribution within rhodium nanocubes is explored by a detailed numerical analysis. The strongest plasmonic hot-spots and charge concentrations are located at the corners and edges of the nanocubes, exactly where they are the most spectroscopically and catalytically active. Because intense catalytic activity at corners and edges will reshape these nanoparticles, distortions of the cubical shape, including surface concavity, surface convexity, and rounded corners and edges, are also explored to quantify how significantly these distortions deteriorate their plasmonic and photocatalytic properties. The fact that the highest fields and highest carrier concentrations occur in the corners and edges of Rh nanocubes (NCs) confirms their tremendous potential for plasmon-enhanced spectroscopy and catalysis. It is shown that this opportunity is fortuitously enhanced by the fact that even higher field and charge concentrations reside at the interface between the metal nanoparticle and a dielectric or semiconductor support, precisely where the most chemically active sites are located.
机译:对于表面增强光谱学和光催化的应用,通过详细的数值分析来探索铑纳米立方体中的紫外线(UV)等离子体行为和电荷分布。最强的等离子体热点和电荷浓度位于纳米立方体的角和边缘,正是它们在光谱和催化活性上最活跃。由于角和边缘处的强烈催化活性将使这些纳米粒子重塑形状,因此还探索了立方形状的变形(包括表面凹度,表面凸度以及圆角和边缘),以量化这些变形在多大程度上降低了其等离子体和光催化性能。 Rh纳米立方(NC)的角和边缘出现了最高的电场和最高的载流子浓度,这一事实证实了它们在等离子体增强光谱和催化方面的巨大潜力。结果表明,由于更高的场和电荷浓度存在于金属纳米粒子与介电或半导体载体之间的界面上,恰好是化学活性最高的位置,因此偶然地增加了这一机会。

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