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Theoretical Study of the Photolysis Mechanisms of Methylpentaphenyldimetallanes (Ph3MM′Ph2Me; M M′ = Si and Ge)

机译:甲基五苯基二金属戊酸酯(Ph3MMPh2Me; MM= Si and Ge)的光解机理的理论研究

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摘要

The mechanisms of the photolysis reactions are studied theoretically at the M06-2X/6-311G(d) level of theory, using the four types of group 14 molecules that have the general structure, Ph3M–M′Ph2Me (M and M′ = Si and Ge), as model systems. This study provides the first theoretical evidence for the mechanisms of these photorearrangements of compounds that contain a M–M′ single bond. The model investigations indicate that the preferred reaction route for the photolysis reactions is, as follows: reactant → Franck-Condon (FC) region → minimum (triplet) → transition state (triplet) → triplet/singlet intersystem crossing → photoproducts (both di-radicals and singlets). The theoretical findings demonstrate that the formation of radicals results from reactions of the triplet states of these reactants. This could be because both the atomic radius and the chemical properties of silicon and germanium are quite similar to each other and compared to other group 14 elements, their photolytic mechanisms are nearly the same. The results for the photolytic mechanisms that are studied in this work are consistent with the available experimental observations and allow for a number of predictions for other group 14 dimetallane analogues to be made.
机译:在理论上以M06-2X / 6-311G(d)的水平对光解反应的机理进行了理论研究,使用了具有一般结构的4种类型的第14组分子,即Ph3M–M′Ph2Me(M和M Si和Ge)作为模型系统。这项研究为包含M–M'单键的化合物的这些光重排的机理提供了第一个理论证据。模型研究表明,光解反应的优选反应路线如下:反应物→弗兰克-康登(FC)区域→最小(三重峰)→过渡态(三重峰)→三重态/单重系统间交叉→光产物(均为双自由基和单线态)。理论发现表明自由基的形成是由于这些反应物的三重态的反应所致。这可能是因为硅和锗的原子半径和化学性质彼此非常相似,并且与其他14族元素相比,它们的光解机理几乎相同。在这项工作中研究的光解机理的结果与现有的实验观察结果一致,并且可以对其他第14组双金属锡类似物做出许多预测。

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