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Demonstration of a Robust All-Silicon-Carbide Intracortical Neural Interface

机译:强大的全碳化硅皮质内神经界面演示

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摘要

Intracortical neural interfaces (INI) have made impressive progress in recent years but still display questionable long-term reliability. Here, we report on the development and characterization of highly resilient monolithic silicon carbide (SiC) neural devices. SiC is a physically robust, biocompatible, and chemically inert semiconductor. The device support was micromachined from p-type SiC with conductors created from n-type SiC, simultaneously providing electrical isolation through the resulting p-n junction. Electrodes possessed geometric surface area (GSA) varying from 496 to 500 K μm2. Electrical characterization showed high-performance p-n diode behavior, with typical turn-on voltages of ~2.3 V and reverse bias leakage below 1 nArms. Current leakage between adjacent electrodes was ~7.5 nArms over a voltage range of −50 V to 50 V. The devices interacted electrochemically with a purely capacitive relationship at frequencies less than 10 kHz. Electrode impedance ranged from 675 ± 130 kΩ (GSA = 496 µm2) to 46.5 ± 4.80 kΩ (GSA = 500 K µm2). Since the all-SiC devices rely on the integration of only robust and highly compatible SiC material, they offer a promising solution to probe delamination and biological rejection associated with the use of multiple materials used in many current INI devices.
机译:近年来,皮层内神经接口(INI)取得了令人瞩目的进步,但长期可靠性仍然令人怀疑。在这里,我们报告高度发展的整体碳化硅(SiC)神经设备的表征。 SiC是一种物理坚固,生物相容且化学惰性的半导体。器件支架由p型SiC微加工而成,导体由n型SiC制成,同时通过所得的p-n结提供电隔离。电极的几何表面积(GSA)为496至500 Kμm 2 。电气特性显示了高性能的p-n二极管性能,典型的开启电压约为2.3V,反向偏置泄漏电流低于1nArms。在-50 V至50 V的电压范围内,相邻电极之间的电流泄漏约为7.5 nArms。这些器件在小于10 kHz的频率下以纯电容关系进行电化学相互作用。电极阻抗范围为675±130kΩ(GSA = 496 µm 2 )到46.5±4.80kΩ(GSA = 500 K µm 2 )。由于全SiC器件仅依赖于坚固且高度兼容的SiC材料的集成,因此它们提供了一种有前途的解决方案,用于探测与当前许多INI器件中使用的多种材料相关的分层和生物排斥。

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