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Microstructure and Enhanced Properties of Copper-Vanadium Nanocomposites Obtained by Powder Metallurgy

机译:粉末冶金获得的铜钒纳米复合材料的组织和增强性能

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摘要

Cu-2.4 wt.%V nanocomposite has been prepared by mechanical alloy and vacuum hot-pressed sintering technology. The composites were sintered at 800 °C, 850 °C, 900 °C, and 950 °C respectively. The microstructure and properties of composites were investigated. The results show that the Cu-2.4 wt.%V composite presents high strength and high electrical conductivity. The composite sintered at 900 °C has a microhardness of 205 HV, a yield strength of 404.41 MPa, and an electrical conductivity of 79.5% International Annealed Copper Standard (IACS); the microhardness and yield strength reduce gradually with the increasing consolidation temperature, which is mainly due to the growth of copper grain size. After sintering, copper grain size and V nanoparticle both maintain in nanoscale; the strengthening mechanism is related to grain boundary strengthening and dispersion strengthening, while the grain boundary strengthening mechanism plays the most important role. This study indicates that the addition of small amounts of V element could enhance the copper matrix markedly with the little sacrifice of electrical conductivity.
机译:通过机械合金和真空热压烧结技术制备了Cu-2.4 wt。%V纳米复合材料。分别在800℃,850℃,900℃和950℃下烧结复合材料。研究了复合材料的微观结构和性能。结果表明,Cu-2.4重量%V复合材料具有高强度和高导电性。在900°C下烧结的复合材料的显微硬度为205 HV,屈服强度为404.41 MPa,电导率为79.5%国际退火铜标准(IACS);显微硬度和屈服强度随着固结温度的升高而逐渐降低,这主要是由于铜晶粒尺寸的增大。烧结后,铜晶粒尺寸和V纳米颗粒均保持纳米级。强化机制与晶界强化和弥散强化有关,而晶界强化机制起着最重要的作用。这项研究表明,少量的V元素的添加可以显着增强铜基体,而几乎不牺牲导电性。

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