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Impact of Stress Annealing on the Magnetization Process of Amorphous and Nanocrystalline Co-Based Microwires

机译:应力退火对非晶态和纳米晶钴基微丝磁化过程的影响

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摘要

The domain wall (DW) dynamics of amorphous and nanocrystalline Co-based glass-coated microwires are explored under the influence of stress annealing. Different annealing profiles have enabled remarkable changes in coercivity and magnetostriction values of Co-based amorphous microwires with initially negative magnitude, allowing induced magnetic bistability in stress-annealed samples and, consequently, high DW velocity has been observed. Similarly, Co-based nanocrystalline microwires with positive magnetostriction and spontaneous bistability have featured high DW velocity. Different values of tensile stresses applied during annealing have resulted in a redistribution of magnetoelastic anisotropy showing a decreasing trend in both DW velocities and coercivity of nanocrystalline samples. Observed results are discussed in terms of the stress dependence on magnetostriction and microstructural relaxation.
机译:在应力退火的影响下,探索了非晶态和纳米晶钴基玻璃涂层微丝的畴壁(DW)动力学。不同的退火轮廓已使Co基非晶态微丝的矫顽力和磁致伸缩值发生了显着变化,其初始值为负值,从而允许在应力退火的样品中产生感应的双稳态,因此观察到了较高的DW速度。同样,具有正磁致伸缩和自发双稳性的Co基纳米晶微丝具有较高的DW速度。退火过程中施加的不同拉伸应力值导致磁弹性各向异性的重新分布,从而显示纳米晶样品的DW速度和矫顽力均呈下降趋势。根据应力对磁致伸缩和微结构松弛的依赖性讨论了观察到的结果。

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