微波等离子体化学气相沉积法制备石墨烯的研究进展

摘要

Due to itsadvantages by low-temperature growth, a widely selection of the substrate materials and easily doped, microwave plasma chemical vapor deposition (MPCVD)is the first choice of the grapheme prepration by large area、high speed、high quality.The several main CVD methods for synthesizinggrapheme are compared.It found out that MPCVD has clear superiority.Then the study of graphene prepared by MPCVD is expatiated.Lastly the application of graphene pre-pared by MPCVD is introduced and also the development trend of graphene prepared by MPCVD is prospected .%微波等离子体化学气相沉积（ MPCVD）法具有低温生长、基底材料选择广泛、容易掺杂等优点，是大面积、高速率、高质量石墨烯制备的首选。首先通过比较制备石墨烯的几种主要CVD方法得出MPCVD法的优势，然后阐述了MPCVD法制备石墨烯的研究，最后介绍了MPCVD法制备的石墨烯的应用并对MPCVD法制备石墨烯的发展趋势进行了展望。