Diffusion kinetics of nitrogen in tantalum during plasma-nitriding

摘要

The activation energies of nitrogen in tantalum on plasma nitriding conditions were calculated according to the experimental data of hardness of plasma nitriding of tantalum vs time and temperature. The activation energy calculated is 148.873±0.390 kJ/mol. The depth increasing of nitriding layer with time follows square root relation. The nitriding process of tantalum is controlled by diffusion of nitrogen atoms in tantalum solid solution. [