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850 nm Implant-confined VCSEL Temperature Characteristics

机译:850 nm植入物限制的VCSEL温度特性

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摘要

The temperature characteristics of VCSEL using proton implantation are described, compared with its edge-emitting counterpart. Implant-confined VCSEL operation has been realized up to 120 ℃. These records of high operating temperature are caused by high characteristic temperature. The relevant physical mechanisms including their dependence on temperature and carrier density are considered. The temperature sensitivity of the threshold current is not strongly increasing with higher temperature.
机译:描述了使用质子注入的VCSEL的温度特性,以及其边缘发射对应物的温度特性。植入物限制的VCSEL操作已达到120℃。这些高工作温度的记录是由高特征温度引起的。考虑了相关的物理机制,包括它们对温度和载流子密度的依赖性。阈值电流的温度灵敏度不会随着温度的升高而强烈增加。

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