High-throughput synthesis of oxidation-resistant Nb–Si based alloy thin film by magnetron co-sputtering

摘要

A high-throughput method was applied to study oxidation behavior of Nb-Si based alloy using composition spread alloy film as combinatorial libraries.An extended range of composition gradients of Nb-Si based alloy film was deposited by（multi）magnetron co-sputtering.The as-deposited film was composed of amorphous phase.Cr2 Nb,Nb5 Si3 and Nbss could be detected after annealing treatment.After oxidation at 1250℃ for 10 min and 20 min,the film composition space was divided into three regions of the distinct oxide scales.The compositions for establishment of the different oxides on Nb-Si based alloy was defined efficiently across the entire composition space by the combinatorial libraries.