Plasma Processing of Boron-Doped Nano-Crystalline Diamond Thin Film Fabricated on Poly-Crystalline Diamond Thick Film

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• 来源
  《等离子体科学和技术（英文版）》 |2010年第4期|433-436|共4页
• 作者

  XIONG Liwei; LIU Fan; WANG Jianhua; MAN Weidong; WENG Jun; LIU Changlin;

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• 作者单位

  Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China;

  Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province,Wuhan Institute of Technology, Wuhan 430073, China;

  Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China;

  Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province,Wuhan Institute of Technology, Wuhan 430073, China;

  Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China;

  Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province,Wuhan Institute of Technology, Wuhan 430073, China;

  Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province,Wuhan Institute of Technology, Wuhan 430073, China;

  Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province,Wuhan Institute of Technology, Wuhan 430073, China;

  Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province,Wuhan Institute of Technology, Wuhan 430073, China;

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