Structure and Mechanical Properties of CrN Thick Films Deposited by High-Rate Medium-Frequency Magnetron Sputtering

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• 来源
  《等离子体科学和技术（英文版）》 |2010年第4期|442-446|共5页
• 作者

  LIU Chuansheng; WANG Hongjun; ZHOU Lin; ZHANG aui; TIAN Canxin; LIMing; FU Dejun;

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• 作者单位

  Accelerator Laboratory, Department of Physics and Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;

  Accelerator Laboratory, Department of Physics and Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;

  Accelerator Laboratory, Department of Physics and Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;

  Accelerator Laboratory, Department of Physics and Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;

  Accelerator Laboratory, Department of Physics and Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;

  Accelerator Laboratory, Department of Physics and Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;

  Accelerator Laboratory, Department of Physics and Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072, China;

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