Optical Emission Spectroscopic Study During the Evaporation of Aluminium in the Thermal Plasma Reactor

摘要

The oxidation of aluminium was studied using optical emission spectroscopy (OES)during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratioof the measured line intensities of AI-O with that of A1 follows the exact trend as of that obtainedfrom the corresponding line intensities in X-ray diffraction spectra of the synthesized samples. Inthis paper the inherent capacity of emission spectroscopy in evaluating the growth processes underplasma induced reactions is presented.