International Symposium on Plasma Chemistry (ISPC) is the most influencial international symposium on science and technology research of low-temperature plasma, especially in the fields related to materials processing. People can be rightly informed of the current devel oping trend of this field from the contents of these symposia. This paper vill introduce briefly a general overview of the 15th ISPC. As viewed from the number of papers and their contents, there is still abundant research on thermal plasma, and the needs for micro-electronic technology and high performance films have driven forward continuous and intensive development of the research on low-pressure, non-equilibrium plasmas, while the research on normal pressure, non-equilibrium plasma has become a new highlight in this field.``
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