Fabrication of Titanium Dioxide Thin Films by DBD-CVD Under Atmosphere

摘要

Titanium dioxide films were firstly deposited on glass substrate by DBD-CVD (dielectric barrier discharge enhanced chemical vapor deposition) technique.The structure of the films was investigated by X-ray diffraction (XRD),scanning electron microscopy (SEM).TiO2 films deposited under atmosphere pressure show preferred orientation,and exhibit columnar-like structure,while TiO2 films deposited under low gas pressure show no preferred orientation.The columnar-like structure with preferred orientation exhibits higher photocatalytic efficiency,since the columnar structure has larger surface area.However,it contributes little to the improvement of hydrophilicity. DBD-CVD is an alternative method to prepare photocatalytic TiO2 for its well-controllable property.