In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited by PEALD for Visible Light Activity

摘要

In this paper,an N-doped titanium oxide（TiO2）photocatalyst is deposited by a plasma-enhanced atomic layer deposition（PEALD）system through the in-situ doping method.X-ray photoelectron spectroscopy（XPS）analysis indicates that substitutional nitrogen atoms（395.9 eV）with 1 atom%are effectively doped into TiO2 films.UV-VIS spectrometry shows that the in-situ nitrogen doping method indeed enhances the visible-activity of TiO2 films in the425-550 nm range,and the results of the performance tests of the N-doped TiO2 films also imply that the photocatalysis activity is improved by in-situ doping.The in-situ doping mechanism of the N-doped TiO2 film is suggested according to the XPS results and the typical atomic layer deposition process.