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High power impulse magnetron sputtering and its applications

机译:大功率脉冲磁控溅射及其应用

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摘要

High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process,which has been demonstrated to be advantageous for better quality coating.Therefore,the mechanism of the HiPIMS technique has recently been investigated.In this paper,the current knowledge of HiPIMS is described.We focus on the mechanical properties of the deposited thin film in the latest applications,including hard coatings,adhesion enhancement,tribological performance,and corrosion protection layers.A description of the electrical,optical,photocatalytic,and functional coating applications are presented.The prospects for HiPIMS are also discussed in this work.
机译:高功率脉冲磁控溅射(HiPIMS)引起了人们的极大关注,因为溅射材料在涂覆过程中被高度电离,这被证明有利于获得更好的涂层质量。因此,近来HiPIMS技术的机理已经被广泛使用。本文介绍了HiPIMS的当前知识。我们重点研究了最新应用中沉积薄膜的机械性能,包括硬涂层,附着力增强,摩擦学性能和腐蚀防护层。介绍了光学,光催化和功能涂料的应用。在本工作中还讨论了HiPIMS的前景。

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  • 来源
    《等离子体科学和技术(英文版)》 |2018年第6期|52-68|共17页
  • 作者单位

    Lab of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600,People's Republic of China;

    Lab of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600,People's Republic of China;

    Lab of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600,People's Republic of China;

    Lab of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600,People's Republic of China;

  • 收录信息 中国科学引文数据库(CSCD);
  • 原文格式 PDF
  • 正文语种 eng
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