首页> 中文期刊> 《等离子体科学和技术:英文版 》 >Damaging Effect of Low Energy N^+ Implantation on Aspergillus niger Spores

Damaging Effect of Low Energy N^+ Implantation on Aspergillus niger Spores

             

摘要

The mutant effects of a keV range nitrogen ion(N^+)beam on enzyme-producingprobiotics were studied,particularly with regard to the induction in the genome.The electronspin resonance(ESR)results showed that the signal of ESR spectrum existed in both implantedand non-implanted spores,and the yields of free radicals increased in a dose-dependent manner.The ionic etching and dilapidation of cell wall could be observed distinctly through the scanningelectron microscope(SEM).The mutagenic effect on genome indicated that N+ implantation couldmake base mutation.This study provided an insight into the roles low-energy ions might play ininducing mutagenesis of micro-organisms.

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