Driven by pulse modulated radio-frequency source,the behavior of SiH 4 /N 2 /O 2 plasma in capacitively coupled discharge are studied by using a one-dimensional fluid model.Totally,48 different species(electrons,ions,neutrals,radicals and excited species) are involved in this simulation.Time evolution of the particle densities and electron temperature with different duty cycles are obtained,as well as the electronegativity n SiH3 /n e of the main negative ion(SiH3).The results show that,by reducing the duty cycle,higher electron temperature and particle density can be achieved for the same average dissipated power,and the ion energy can also be effectively reduced,which will offer evident improvement in plasma deposition processes compared with the case of continuous wave discharge.
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