机译:C:F沉积对CHF3 60 MHz / 2 MHz双频电容耦合等离子体中SiCOH低k膜蚀刻的影响
School;
of;
Physics;
Science;
and;
Technology,;
Jiangsu;
Key;
Laboratory;
of;
Thin;
Films,;
Soochow;
University,;
Suzhou;
215006,;
China;
等离子体沉积; 沉积薄膜; CHF3; 蚀刻; 容性耦合; 双频; 等离子体刻蚀; 血浆浓度;