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Laser scribed graphene for supercapacitors

机译:Laser scribed graphene for supercapacitors

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摘要

Supercapacitors,with the merits of both capacitors for safe and fast charge and batteries for high energy storage have drawn tremendous attention.Recently,laser scribed graphene has been increasingly studied for supercapacitor applications due to its unique properties,such as flexible fabrication,large surface area and high electrical conductivity.With the laser direct writing process,graphene can be directly fabricated and patterned as the supercapacitor electrodes.In this review,facile laser direct writing methods for graphene were firstly summarized.Various precursors,mainly graphene oxide and polyimide were employed for laser scribed graphene and the modifications of graphene properties were also discussed.This laser scribed graphene was applied for electrochemical double-layer capacitors,pseudo-capacitors and hybrid supercapacitors.Diverse strategies including doping,composite materials and pattern design were utilized to enhance the electrochemical performances of supercapacitors.Featured supercapacitors with excellent flexible,ultrafinestructured and integrated functions were also reviewed.

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  • 来源
    《光电进展(英文版)》 |2021年第7期|1-21|共21页
  • 作者

    Zhengfen Wan; Xi Chen; Min Gu;

  • 作者单位

    Institute of Photonic Chips University of Shanghai for Science and Technology Shanghai 200093 China;

    Centre for Artificial-Intelligence Nanophotonics School of Optical-Electrical and Computer Engineering University of Shanghai for Science and Technology Shanghai 200093 China;

    Institute of Photonic Chips University of Shanghai for Science and Technology Shanghai 200093 China;

    Centre for Artificial-Intelligence Nanophotonics School of Optical-Electrical and Computer Engineering University of Shanghai for Science and Technology Shanghai 200093 China;

    Institute of Photonic Chips University of Shanghai for Science and Technology Shanghai 200093 China;

    Centre for Artificial-Intelligence Nanophotonics School of Optical-Electrical and Computer Engineering University of Shanghai for Science and Technology Shanghai 200093 China;

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