利用溶胶-凝胶法制备了有机-无机杂化光敏性SiO2-TiO2材料,在单晶硅基片上旋转涂膜,经前烘、紫外光固化、淋洗、后烘等步骤,在硅片上得到复制有掩模微图案的薄膜.用紫外-可见光-近红外分光光度计测试了薄膜的光透过吸收性质,用Fourier红外光谱仪测试了不同紫外光辐照时间下薄膜的红外振动吸收光谱,用高倍光学显微镜和扫描电子显微镜(SEM)观察制备得到的薄膜微图案.结果表明:薄膜在紫外可见光区域的光透过率约为90％,紫外光照能促使不同的官能团间发生缩聚反应,80℃前烘温度处理以及15 min左右的紫外光辐照能够得到清晰、精确的薄膜微图案.%Organic-inorganic hybrid Photosensitive SiO2-TiO2 materials were synthesized by a sol-gel process. The hybrid films were deposited on silica glass substrates and silicon wafers by spin-coating. After the process of prebaking, UV-light exposure and postbaking, the films with the same patterning of mask were obtained. The Optical transmittance and absorption of hybrid films were measured with a ultraviolet-visible-near infrared spectrometer. Their infrared spectra of films at different UV irradiation time were measured with Fourier infrared spectrometer. The surface micro-structures prepared were observed by optical microscopy with a high-resolution CCD camera and Scanning Electron Microscope (SEM). The results show that light transmittances of the hybrid films are nearly 90% in the visible and near infrared range and UV curing has an effect of producing the photopolymerization of methacrylate species. Being prebaked at 80°C and irradiated with UV light for 15 minutes are very crucial to get clear and precise patterns.
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