Key Laboratory of Chemical Lasers;
Dalian Institute of Chemical Physics;
Chinese Academy of Sciences;
Dalian;
116023;
China;
State Key Laboratory of ASIC&System;
School of Information Science and Technology;
Fudan University;
Shanghai;
200433;
China;
School of Materials Science and Engineering;
Xi’an Polytechnic University;
Xi’an;
710048;
China;
Division of Physics and Applied Physics;
School of Physical and Mathematical Sciences;
Nanyang Technological University;
637371;
Singapore;
Singapore;
University of Chinese Academy of Sciences;
Beijing;
100049;
China;
interface mode; monolayer tungsten disulfide; low-frequency Raman spectroscopy; sample-substrate interaction; strain; chemical vapor deposition;