机译:层结构拓扑绝缘体SnBi2Te4纳米板中的原子障碍
Materials Engineering, University of Queensland, Brisbane, QLD 4072, Australia;
Department of Materials Science & Engineering, the University of Texas at Dallas, Richardson, TX 75080, USA;
Materials Engineering, University of Queensland, Brisbane, QLD 4072, Australia;
Centre for Microscopy and Microanalysis, University of Queensland, Brisbane, QLD 4072, Australia;
Materials Engineering, University of Queensland, Brisbane, QLD 4072, Australia;
Centre for Future Materials, University of Southern Queensland, Springfield, QLD 4300, Australia;
Laboratory of Surface Physics and Department of Physics, and Collaborative Innovation Center of Advanced Microstructures, Fudan University, Shanghai200433, China;
Department of Materials Science & Engineering, the University of Texas at Dallas, Richardson, TX 75080, USA;
Beijing Key Lab of Microstructure and Property of Advanced Materials, Institute of Microstructure and Properties of Advanced Materials, Beijing University of Technology, Beijing 100124, China;
Materials Engineering, University of Queensland, Brisbane, QLD 4072, Australia;
Beijing Key Lab of Microstructure and Property of Advanced Materials, Institute of Microstructure and Properties of Advanced Materials, Beijing University of Technology, Beijing 100124, China;
Centre for Microscopy and Microanalysis, University of Queensland, Brisbane, QLD 4072, Australia;
WPI, Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aobo-ku, Sendai 980-8577, Japan;
Quantum Materials, Science and Technology Department, International Iberian Nanotechnology Laboratory, 4715-330 Braga, Portugal;
Laboratory of Surface Physics and Department of Physics, and Collaborative Innovation Center of Advanced Microstructures, Fudan University, Shanghai200433, China;