首页> 中文期刊> 《纳微快报:英文版》 >Superior Pseudocapacitive Storage of a Novel Ni3Si2/ NiOOH/Graphene Nanostructure for an All‑Solid‑State Supercapacitor

Superior Pseudocapacitive Storage of a Novel Ni3Si2/ NiOOH/Graphene Nanostructure for an All‑Solid‑State Supercapacitor

         

摘要

Recent developments in the synthesis of graphene-based structures focus on continuous improvement of porous nanostructures,doping of thin films,and mechanisms for the construction of threedimensional architectures.Herein,we synthesize creeper-like Ni3Si2/NiOOH/graphene nanostructures via low-pressure all-solid meltingreconstruction chemical vapor deposition.In a carbon-rich atmosphere,high-energy atoms bombard the Ni and Si surface,and reduce the free energy in the thermodynamic equilibrium of solid Ni–Si particles,considerably catalyzing the growth of Ni–Si nanocrystals.By controlling the carbon source content,a Ni3Si2 single crystal with high crystallinity and good homogeneity is stably synthesized.Electrochemical measurements indicate that the nanostructures exhibit an ultrahigh specific capacity of 835.3 C g^−1(1193.28 F g^−1)at 1 A g^−1;when integrated as an all-solidstate supercapacitor,it provides a remarkable energy density as high as 25.9 Wh kg^−1 at 750 W kg^−1,which can be attributed to the freestanding Ni3Si2/graphene skeleton providing a large specific area and NiOOH inhibits insulation on the electrode surface in an alkaline solution,thereby accelerating the electron exchange rate.The growth of the high-performance composite nanostructure is simple and controllable,enabling the large-scale production and application of microenergy storage devices.

著录项

  • 来源
    《纳微快报:英文版》 |2021年第1期|P.15-28|共14页
  • 作者单位

    The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology Xidian University Xi’an 710071 People’s Republic of ChinaShaanxi Joint Key Laboratory of Graphene Xidian University Xi’an 710071 People’s Republic of China;

    The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology Xidian University Xi’an 710071 People’s Republic of ChinaShaanxi Joint Key Laboratory of Graphene Xidian University Xi’an 710071 People’s Republic of China;

    The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology Xidian University Xi’an 710071 People’s Republic of ChinaShaanxi Joint Key Laboratory of Graphene Xidian University Xi’an 710071 People’s Republic of China;

    The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology Xidian University Xi’an 710071 People’s Republic of ChinaShaanxi Joint Key Laboratory of Graphene Xidian University Xi’an 710071 People’s Republic of China;

    The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology Xidian University Xi’an 710071 People’s Republic of ChinaShaanxi Joint Key Laboratory of Graphene Xidian University Xi’an 710071 People’s Republic of China;

    The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology Xidian University Xi’an 710071 People’s Republic of ChinaShaanxi Joint Key Laboratory of Graphene Xidian University Xi’an 710071 People’s Republic of China;

    The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology Xidian University Xi’an 710071 People’s Republic of ChinaShaanxi Joint Key Laboratory of Graphene Xidian University Xi’an 710071 People’s Republic of China;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 TM9;
  • 关键词

    Pseudocapacitive storage; Creeper-like Ni3Si2; NiOOH; Graphene; All-solid-state supercapacitors;

    机译:伪电容存储;蠕变型Ni3Si2;NiOOH;石墨烯;全固态超级电容器;
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