高压下光电材料结构相变及物理性能的研究进展

摘要

High-pressure technique can efficiently tune the crystal lattice and electronic state of photoelectric materials.It is a feasible route to adjust physical properties of photoelectric materials,and an important method for synthesizing new photoelectric materials.A review of the high-pressure research progress on photoelectric materials is summarized.The effects of high-pressure condition on the crystal structure,electronic configuration and physical properties of photoelectric materials are described.The mechanism of enhancing light absorption,conductivity and photoelectric performance is analyzed.The intrinsic relation between the pressure-induced structural phase transition and physical properties is discussed.The development possibility of the high-pressure research on photoelectric materials is in prospect.%高压技术能够有效调节光电材料的晶格和电子态,是调控光电材料物理性能的可行手段及合成新光电材料的重要方法.概述了国内外光电材料的高压研究现状,介绍了高压作用对光电材料晶体结构、电子构型及物理性能的影响,分析了高压下光吸收、电导率及光电性能的增强机制,探讨了压力诱导结构相变与物理性能的内在联系.展望了光电材料高压研究的发展.