Low-loss metasurface optics down to the deep ultraviolet region

摘要

Shrinking conventional optical systems to chip-scale dimensions will benefit custom applications in imaging,displaying,sensing,spectroscopy,and metrology.Towards this goal,metasurfaces-planar arrays of subwavelength electromagnetic structures that collectively mimic the functionality of thicker conventional optical elements-have been exploited at frequencies ranging from the microwave range up to the visible range.Here,we demonstrate highperformance metasurface optical components that operate at ultraviolet wavelengths,including wavelengths down to the record-short deep ultraviolet range,and perform representative wavefront shaping functions,namely,highnumerical-aperture lensing,accelerating beam generation,and hologram projection.The constituent nanostructured elements of the metasurfaces are formed of hafnium oxide-a loss-less,high-refractive-index dielectric material deposited using low-temperature atomic layer deposition and patterned using high-aspect-ratio Damascene lithography.This study opens the way towards low-form factor,multifunctional ultraviolet nanophotonic platforms based on flat optical components,enabling diverse applications including lithography,imaging,spectroscopy,and quantum information processing.