首页> 中文期刊> 《武汉理工大学学报:材料科学英文版》 >Remarkable Improvement of Ferroelectric Properties and Leakage Current in BiFeO_3 Thin Films by Nd Modification

Remarkable Improvement of Ferroelectric Properties and Leakage Current in BiFeO_3 Thin Films by Nd Modification

         

摘要

Ferroelectric and leakage properties are important for ferroelectric applications. Pure and Nd-doped(x=0.05-0.20) BiFeO_3 thin films were fabricated by sol-gel method on FTO substrates. The phase structure, surface morphology, leakage current, ferroelectric properties, and optical properties of BiFeO_3-based thin films were investigated. The substitution of Nd^(3+) ions for the Bi^(3+) site converts the structure from rhombohedral to coexisting tetragonal and orthorhombic. Nd doping improves the crystallinity of BiFeO_3 thin films. The leakage current of Nd-doped BiFeO_3 decreases by two to three orders of magnitude compared with that of pure BiFeO_3. Among the samples, 15% Nd-doped BiFeO_3 exhibits the strongest ferroelectric polarization of 17.96 μC/cm^2. Furthermore, the absorption edges of Bi_(1-x)Nd_(x)FeO_3 thin films show a slight red-shift after Nd doping.

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