The development of arc-discharge was studied under the condition of high frequency pulse discharge. The result is obtained that the capability to restrain arc-discharge becomes better while pulse frequency of the power supply raise ,and that fast arc-discharge detecting and circuit protecting is needed. Some valid bases are given for the design of high frequency plasma pulse power supply.%在高频直流脉冲放电的条件下,对低气压放电过程中存在的弧光放电的发展过程进行了研究,揭示了脉冲放电频率的提高对抑制弧光放电的发展是有效的,而快速的弧光放电检测和保护电路是不可缺少的.为一种新型等离子体高频激励电源的研制提供了有效的依据.
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