This method describes a simultaneous electrodeposition procedure that is specific-ally adapted for the source preparation of transuranic elements including Np,Pu,Am and Cm for high resolution alpha spectrometric measurement.The effects of electrolyte concen-tration,pH of buffer,current density and the plating time on the source quality were exam-ined in order to optimize the conditions and to obtain the maximum yield.The electrodeposi-tion yields of 237 Np,238 Pu,243 Am and 244 Cm are higher than 96％ with the ammonium sulfate concentration of 0.2 mol/L,pH ranging from 2.0 to 2.5,current density at 0.40-0.50 A/cm2 ,and plating time over 60 min.In the light of good reproducibility and robustness of the process,the recommended procedure for rapid simultaneous quantitative electrodeposition of Np,Pu,Am and Cm is suitable to preparing high quality mixed transuranic alpha sources.%为制备高分辨率Np、Pu、Am和Cm的α混合测量源,研究了电沉积液介质浓度、pH值、电流密度、电沉积时间等条件对电沉积效率及沉积源质量的影响.结果表明,在pH为2.0～2.5的0.2 mol/L硫酸铵介质中,电流密度为0.40～0.50 A/cm2,室温条件下电沉积60 min,237 Np、238 Pu、243 Am和244 Cm在阴极不锈钢片上的电沉积效率均大于96％,制备的α测量源能量分辨率较好.
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