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Effects of Exogenous Silicon on the Activities of Antioxidant Enzymes and Lipid Peroxidation in Chilling-Stressed Cucumber Leaves

机译:外源硅对低温胁迫下黄瓜叶片抗氧化酶活性和脂质过氧化的影响

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In order to increase vegetable productivity by improving environmental conditions,this article investigates the effects of exogenous silicon on the activities of major antioxidant enzymes and on lipid peroxidation under chilling stress,and it examines whether silicon-induced chilling tolerance is mediated by an increase in antioxidant activity.Cucumis sativus cv.Jinchun 4 was hydroponically cultivated to the two-leaf stage,at which point seedlings were watered with different concentrations of silicon (0,0.1 and 1 mmol L-1) and separately exposed to normal (25/18℃) or chilling (15/8℃) temperatures for six days under low light (100 umol m-2 s-1).Data were collected from the second leaves on the percentage of withering and the levels of endogenous silicon,malondialdehyde (MDA),hydrogen peroxide (H2O2),superoxide radical (O2·-),rnsuperoxide dismutase (SOD,EC 1.15.1.1),glutathione peroxidase (GSH-Px,EC 1.11.1.9),ascorbate peroxidase (APX,EC 1.11.1.11),monodehydroascorbate reductase (MDHAR,EC 1.6.5.4),glutathione reductase (GR,EC 1.6.4.2),reduced glutathione (GSH) and ascorbate (AsA).Compared to normal temperatures,chilling resulted in partially withered leaves and increased MDA content.When 0.1 or 1 mmol L-1 exogenous silicon was combined with chilling.the withering of the cucumber leaves was reduced relative to the original chilling treatment,while the endogenous silicon content was increased,antioxidants such as SOD,GSH-Px,APX,MDHAR,GR,GSH,and AsA were more active,and the levels of H2O2,O2·-,and MDA were lower.We propose that exogenous silicon leads to greater deposition of endogenous silicon and thereby increases antioxidant activities and reduces lipid peroxidation induced by chilling.
机译:为了通过改善环境条件来提高蔬菜生产率,本文研究了外源硅对大致抗氧化酶和脂质过氧化在冷胁迫下的影响,并且它检查了硅诱导的冷却耐受性是否通过抗氧化的增加来介导Activity.Cucumis Sativus CV.Jinchun 4被水疏入到双叶阶段,此时幼苗用不同浓度的硅(0.0.1和1mmol L-1)浇水,并单独暴露于正常(25/18℃ )或在低光(100μlM-2S-1)下六天的冷却(15/8℃)温度从第二片叶片收集,以枯萎的百分比和内源性硅,丙二醛(MDA)的百分比。 ,过氧化氢(H2O2),超氧化物自由基(O2· - ),RnSuperoxide歧化酶(SOD,EC 1.15.1.1),谷胱甘肽过氧化物酶(GSH-PX,EC 1.11.9),抗坏血酸过氧化物酶(APX,EC 1.11.11),单羟基血萎阴本还原酶(Mdhar,E C 1.6.5.4),谷胱甘肽还原酶(GR,EC 1.6.4.2),降低谷胱甘肽(GSH)和抗坏血酸(ASA)。与正常温度相比,冷却导致部分含有部分枯萎的叶片和增加的MDA含量。0.1或1mmol -1外源性硅与冷却相结合。相对于原始的冷冻处理,黄瓜叶的枯萎病,而内源性硅含量增加,抗氧化剂如SOD,GSH-PX,APX,MDHAR,GR,GSH和ASA更活跃,H 2 O 2,O 2· - 和MDA的水平较低。我们提出了外源硅导致内源性硅的更大沉积,从而增加抗氧化活性并减少冷却诱导的脂质过氧化。

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