黄光激光器聚光元件减反膜的研究

摘要

为满足589nm黄光激光器聚光元件双波段减反膜的使用要求，根据有效界面法设计原理设计膜系，以Ta2O5和SiO2为镀膜材料，使用TFC膜系设计软件对膜系进行优化，运用电子束蒸发方法和离子束辅助沉积方法，在零膨胀玻璃上镀制589nm反射率在2%~3%之间、1064nm反射率小于1%的双波段减反膜，通过膜系结构和工艺参数的优化解决了589nm反射率在2%~3%之间难以控制的问题，获得了符合聚光元件使用要求的减反射薄膜。%To meet the requirements of dual band antireflection coating which is applied to condensing element of yel-low lasers,film is designed by effective interface method design principle;Ta2O5 and SiO2 as coating materials are cho-sen;film is optimized by TFC film design software,with the aid of ion assistant deposition systems on zero-expansion glass electronic beaming vacuum depositing method is adopted .This dual band antireflection coating requires reflectivity between 2%~3% at 589 nm and less than 1% at 1064 nm. The problem of reflectivity uncontrolled between 2%~3%at 589 nm is solved by optimizing membrane system structure and technological parameters. The antireflection coating which used on the collective optics is acquired.