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An analytical model to explore open-circuit voltage of a-Si:H/c-Si heterojunction solar cells

机译:探索a-Si:H / c-Si异质结太阳能电池开路电压的分析模型

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摘要

The effect of the parameters on the open-circuit voltage, VOC of a- Si:H/c-Si heterojunction solar cells was explored by an analytical model. The analytical results show that VOC increases linearly with the logarithm of illumination intensity under usual illumination. There are two critical values of the interface state density ( Dit ) for the open-circuit voltage (VOC),Ditcrit,1andDitcrit,2 (a few 1010cm-2?eV-1).VOC decreases remarkably when Dit is higher thanDitcrit,1. To achieve high VOC, the interface states should reduce down to a few 1010cm-2?eV-1. Due to the difference between the effective density of states in the conduction and valence band edges of c-Si, the open-circuit voltage of a-Si:H/c-Si heterojunction cells fabricated on n-type c-Si wafers is about 22 mV higher than that fabricated on p-type c-Si wafers at the same case. VOC decreases with decreasing the a-Si:H doping concentration at low doping level since the electric field over the c-Si depletion region is reduced at low doping level. Therefore, the a-Si:H layer should be doped higher than a critical value of 5×1018 cm-3 to achieve high VOC.
机译:通过分析模型探讨了参数对a-Si:H / c-Si异质结太阳能电池开路电压VOC的影响。分析结果表明,在常规照明条件下,VOC随照明强度的对数线性增加。开路电压(VOC)的界面状态密度(Dit)有两个临界值,Ditcrit,1和Ditcrit,2(大约1010cm-2?eV-1)。当Dit高于Ditcrit,1时,VOC显着降低。 。为了获得较高的VOC,接口状态应减小到几个1010cm-2?eV-1。由于c-Si导带和价带边缘的有效态密度不同,在n型c-Si晶片上制造的a-Si:H / c-Si异质结单元的开路电压约为在相同情况下比在p型c-Si晶片上制造的电压高22 mV。在低掺杂水平下,VOC随着a-Si:H掺杂浓度的降低而降低,这是因为在低掺杂水平下c-Si耗尽区上的电场减小了。因此,a-Si:H层应掺杂成高于5×1018 cm-3的临界值,以实现较高的VOC。

著录项

  • 来源
    《中南大学学报(英文版)》 |2016年第3期|598-603|共6页
  • 作者单位

    Department of Electronics Science and Information Engineering, Hunan University of Technology, Zhuzhou 412007, China;

    School of Electronics and Information Engineering, South China University of Technology, Guangzhou 510640, China;

    School of Electronics and Information Engineering, South China University of Technology, Guangzhou 510640, China;

    Department of Electronics Science and Information Engineering, Hunan University of Technology, Zhuzhou 412007, China;

    Department of Electronics Science and Information Engineering, Hunan University of Technology, Zhuzhou 412007, China;

  • 收录信息 中国科学引文数据库(CSCD);
  • 原文格式 PDF
  • 正文语种 eng
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