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The Characterisation of Residual Strain in Ensis siliqua Shells

机译:Ensis siliqua贝壳中残余应变的表征

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摘要

This study reports the variation of residual strains within the posterior ventral area of the Ensis siliqua mollusc shell, as determined using glancing incidence synchrotron X-ray diffraction. The outer layer of this structure exhibits a tensile strain, in contrast to a compressive strain observed within the inner layer. Fluctuations in unit cell parameters for the inner layer have been determined, showing that the microscopic prismatic layer of the structure exhibits a compressive strain orientated parallel to the surface of the shell. This is thought to enhance the crack deflection properties of this layer, and aid in resisting catastrophic failure. Further analysis of residual strains has been performed using the same method, throughout several stages of compressive testing of the anterior dorsal region of the shell. This identified no variation in residual strains at various levels of loading, and it is therefore proposed that load may be transferred via the organic matrix of mollusc shell structures. A Raman spectroscopic investigation, comparing whole and powdered shell with non-biogenic aragonite, has shown that residual strains are also present in this analagous material which is devoid of organic content. This indicates that the observed strain is not entirely due to the organic matrix.
机译:这项研究报告了残留的应变的变化在Ensis siliqua软体动物壳后腹区域内的变化,该变化是通过掠入射同步加速器X射线衍射确定的。与在内层中观察到的压缩应变相反,该结构的外层显示出拉伸应变。已经确定了内层的晶胞参数的波动,表明该结构的微观棱柱层表现出平行于壳表面取向的压缩应变。认为这增强了该层的裂纹偏转性能,并有助于抵抗灾难性破坏。在壳体前背区域的压缩测试的多个阶段中,都使用相同的方法对残余应变进行了进一步的分析。这表明在各种载荷水平下残余应变没有变化,因此建议可以通过软体动物壳结构的有机基质来传递载荷。拉曼光谱研究将整个壳和粉壳与非生物文石进行了比较,结果表明,这种无水有机材料中还残留有应变。这表明观察到的应变并非完全归因于有机基质。

著录项

  • 来源
    《仿生工程学报(英文版)》 |2006年第1期|33-38|共6页
  • 作者单位

    Materials Science Centre, School of Materials, University of Manchester, Grosvenor Street, Manchester M1 7HS, UK;

    Materials Science Centre, School of Materials, University of Manchester, Grosvenor Street, Manchester M1 7HS, UK;

    CCLRC Daresbury Laboratory, Warrington, Cheshire WA4 4AD, UK;

    CCLRC Daresbury Laboratory, Warrington, Cheshire WA4 4AD, UK;

    Materials Science Centre, School of Materials, University of Manchester, Grosvenor Street, Manchester M1 7HS, UK;

    Materials Science Centre, School of Materials, University of Manchester, Grosvenor Street, Manchester M1 7HS, UK;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 仿生学;
  • 关键词

    Ensis siliqua shell; residual strain; synchrostron X-ray diffraction;

    机译:Ensis siliqua壳;残余应变;同步辐射X射线衍射;
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