集成高分子光子学器件平台

摘要

在高分子基板上制作成的单膜全氟高分子波导结构,具有非热敏感性、偏振无关的工作特点,同时,在1310 nm、1550 nm工作波长分别有＜0.04和＜0.05 dB/cm的超低光损耗.本文研究了在器件制作过程中所产生的孔状结构对传输损耗的直接影响.实验证明,超低的传输损耗可以通过降低孔状结构的尺度至纳米范围来实现.这些波导结构可以成为新一代高性能集成高分子光子器件的技术平台.%Single mode perfluoropolymer waveguide structures, fabricated on polymer substrates for athermal operation, exhibit polarization independent, ultra low loss of＜0.04 and ＜ 0.05 dB/cm at 1310 and 1550 nm, respectively. Porous structure that arises during the fabrication process is studied by considering its implications in the propagation loss. We demonstrate that porous structure is to be reduced to nanoscale, in order to realize waveguides structure with ultralow propagation losses. These waveguide architectures form the basis for a new photonic polymer device technology platform for high performance integrated devices.