机译:采用HBM SiGe 0.3μmBiCMOS工艺的5 GHz低噪声放大器的设计
Institute of RF-&OE-ICs, Southeast University , Nanjing 210096, P.R.China;
Institute of RF-&OE-ICs, Southeast University , Nanjing 210096, P.R.China;
Institute of RF-&OE-ICs, Southeast University , Nanjing 210096, P.R.China;
Institute of RF-&OE-ICs, Southeast University , Nanjing 210096, P.R.China;
Institute of RF-&OE-ICs, Southeast University , Nanjing 210096, P.R.China;