Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared

摘要

Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications.Unfortunately,achieving large-scale and heat-tolerant absorbers has been remained challenging work because of costly and time-consuming lithography methods and thermolability of materials,respectively.Here,we demonstrate a thermally robust titanium nitride broadband absorber with＞95％absorption efficiency in the visible and near-infrared region(400-900 nm).A relatively large-scale(2.5 cm x 2.5 cm)absorber device is fabricated by using a fabrication technique of multiple-patterning colloidal lithography.The optical properties of the absorber are still maintained even after heating at the temperatures＞600℃.Such a large-scale,heat-tolerant,and broadband near-perfect absorber will provide further useful applications in solar thermophotovoltaics,stealth,and absorption controlling in high-temperature conditions.