In order to study the photosynthetic characteristics of Triarrhena Lutarioriparia L Liu under different nitrogen rates, the difference in photosynthetic parameters was compared by pot experiment with 5 nitrogen rate treatments. Results indicated that Pn(net photosynthetic rate) and the chlorophyll content were increased in nitrogen rate range-of 0 -4 g/ plant Higher Gs(stomatal conductance) and T,(transpiration rate) appeared simultaneously with higher Pn, while C,( intercellular CO, concentration) showed contrary. P, and the chlorophyll content were the highest (24.47 μmol/m2·s and 3.6445 mg/g) at level of 4 g/plant nitrogen application. Significant positive correlation existed between chlorophyll content and net photosynthetic rate ( r =0. 892 ). The light - response curves were different under different nitrogen application rates. Rd ( apparent dark respiration rate) and LCP (light compensation point) were increased after the nitrogen application. AQY (apparent quantum yield) was higher at the level of 2 g/plant and 4 g/plant nitrogen application. Pn increased in the range of 2 ～ 4 g/plant nitrogen application.%为揭示南荻(Triarrhena lutarioriparia L.Liu)在不同氮素水平下的光合生理特性,本研究采用盆栽试验,比较了四倍体南荻在5种不同施氮水平处理下光合作用参数之间的差异.结果表明,在0 ～4 g/株氮素水平范围内,随着施氮量的增加,各处理净光合速率(Pn)、叶绿素含量随之增加.净光合速率较高的处理其植株的气孔导度(G8)、蒸腾速率(Tr)也较高,而胞间二氧化碳浓度(Ci)较低.在施氮水平为4g/株时,南荻叶片净光合速率和叶绿素含量达最大值,分别为24.47 μmol/m2·s和3.64 mg/g.叶绿素含量与净光合速率呈显著正相关(r =0.892*).不同施氨水平南荻植株光响应曲线不同,施氮可提高南荻暗呼吸速率(Rd)和光补偿点(LCP)；在施氮为2g/株和4g/株处理时有较高的表观量子效率(AQY)；在2～4g/株氮素水平范围内,植株最大净光合速率较大.
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