首页> 中文期刊> 《中国物理快报:英文版》 >Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge

Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge

         

摘要

Carbon nitride films have been prepared by reactive sputtering using hollow cathode discharge.Auger spectra show that the nitrogen content is about 20-25at.%in the bulk.Infrared(IR)spectra,display three broad absorption bands.After heating treatmentf changes of IR spectra suggest that the nitrogen incorporating in the bonding network of amorphous is thermally stable and hydrogen conient decreases.

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