首页> 中文期刊> 《中国物理快报:英文版》 >InAlAs/InGaAs Quantum Well Infrared Photodetectors with 3-5μm Band Grown by Gas Source Molecular Beam Epitaxy

InAlAs/InGaAs Quantum Well Infrared Photodetectors with 3-5μm Band Grown by Gas Source Molecular Beam Epitaxy

         

摘要

The relationship between well width and subband energy as well as response wavelength of the InAlAs/InGaAs multi-quantum well structures have been calculated for the design of the devices by using Kronig-Penney model.By using gas source molecular beam epitaxy grown InAlAs/InGaAs quantum well infrared photodetector(QWIP)materials have been used to fabricate QWIP devices with 3-5μm band.Ⅰ-Ⅴ characteristics and response spectra of the devices have been measured.Results show that the devices have peak response at 4.0μm with full width of half maximum of about 29.5meV.

著录项

  • 来源
    《中国物理快报:英文版》 |1997年第6期|P.443-445|共3页
  • 作者单位

    State Key Laboratory of FUnctional Materials for Informatics Shanghai Institute of Metallurgy Chinese Academy of Sciences Shanghai 200050;

    State Key Laboratory of FUnctional Materials for Informatics Shanghai Institute of Metallurgy Chinese Academy of Sciences Shanghai 200050;

    State Key Laboratory of FUnctional Materials for Informatics Shanghai Institute of Metallurgy Chinese Academy of Sciences Shanghai 200050;

    State Key Laboratory of FUnctional Materials for Informatics Shanghai Institute of Metallurgy Chinese Academy of Sciences Shanghai 200050;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 光电子技术、激光技术;
  • 关键词

    InAlAs/InGaAs; Epitaxy; Infrared;

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