首页> 中文期刊> 《中国物理快报:英文版》 >Photoluminescent Properties of ZnO Films Deposited on Si Substrates

Photoluminescent Properties of ZnO Films Deposited on Si Substrates

         

摘要

The photoluminescence of ZnO films deposited on Si substrates by reactive dc sputtering has been studied by using a synchrotron radiation (SR) light source. The excitation spectra show a strong excitation band around 195nm related to the 390nm emission band. Under SR vacuum ultraviolet excitation, a new emission band peaked at 290nm was found for the first time, besides the ultraviolet emission band (390nm) and green band (520nm).

著录项

  • 来源
    《中国物理快报:英文版》 |2001年第3期|441-442|共2页
  • 作者单位

    National Synchrotron Radiation Laboratory;

    National Synchrotron Radiation Laboratory;

    National Synchrotron Radiation Laboratory;

    National Synchrotron Radiation LaboratoryrnDepartment of Physics, University of Science and Technology of China, Hefei 230026;

    Ⅱ Institut fur Experimental Physik der Universitat Hamburg, Germany;

    Ⅱ Institut fur Experimental Physik der Universitat Hamburg, Germany;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 04;
  • 关键词

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号