首页> 中文期刊> 《中国物理快报:英文版》 >Low-Threshold and High-Power Oxide-Confined 850 nm AlInGaAs Strained Quantum-Well Vertical-Cavity Surface-Emitting Lasers Based on Intra-Cavity Contacted Structure

Low-Threshold and High-Power Oxide-Confined 850 nm AlInGaAs Strained Quantum-Well Vertical-Cavity Surface-Emitting Lasers Based on Intra-Cavity Contacted Structure

         

摘要

@@ The low-threshold and high-power oxide-confined 850 nm AlInGaAs strained quantum-well (QW) vertical-cavity surface-emitting lasers (VCSELs) based on the intra-cavity contacted structure are fabricated. The threshold current of 0.1 mA for a 10-μm oxide-aperture device is obtained with the threshold current density of 0. 127kA/cm2.For a 22-μm oxide-aperture device, the peak optical output power reaches to 14.6mW at the current injection of 25mA under the room temperatureand pulsed operation with a threshold current of 2mA, which corresponds to the threshold current density of 0.526kA/cm2. The lasing wavelength is 855.4nm. The full wave at half maximum is 2.2nm. The analysis of the characteristics and the fabrication of VCSELs are also described.

著录项

  • 来源
    《中国物理快报:英文版》 |2005年第12期|3074-3076|共3页
  • 作者单位

    Beijing Optoelectronic Technology Laboratory, Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022;

    Beijing Optoelectronic Technology Laboratory, Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022;

    Beijing Optoelectronic Technology Laboratory, Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022;

    Beijing Optoelectronic Technology Laboratory, Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022;

    Beijing Optoelectronic Technology Laboratory, Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022;

    Beijing Optoelectronic Technology Laboratory, Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022;

    Beijing Optoelectronic Technology Laboratory, Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022;

    Beijing Optoelectronic Technology Laboratory, Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022;

    Beijing Optoelectronic Technology Laboratory, Institute of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100022;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 物理学;
  • 关键词

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