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Flexible Cu(In,Ga)Se2 Thin-Film Solar Cells on Polyimide Substrate by Low-Temperature Deposition Process

机译:低温沉积法在聚酰亚胺衬底上制备柔性Cu(In,Ga)Se2薄膜太阳能电池

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摘要

The electrical and structural properties of polycrystalline Cu(In,Ga)Se2 films grown on polyimide (PI) substrates below 400℃ via one-stage and three-stage co-evaporation process have been investigated by x-ray diffraction spectra (XRD),scanning electron microscopy (SEM) and Hall effect measurement.As shown by XRD spectra,the stoichiometric CIGS films obtained by one-stage process exhibit the characteristic diffraction peaks of the (In0.68Ga0.32)2Se3 and Cu(In0.7Ga0.3)2Se.It is also found that the film structures indicate more columnar and compact than the three-stage process films from SEM images.The stoichiometric CIGS films obtained by three-stage process exhibit the coexistence of the secondary phase of (In0.68Ga0.32)2Se3,Cu2-xSe and Cu(In0.7Ga0.3)2Se.High net carrier concentration and sheet conductivity are also observed for this kind of film,related to the presence of Cu2-xSe phase.As a result,when the CIGS film growth temperature is below 400℃,the three-stage process is inefficient for solar cells.By using the one-stage co-evaporation process,the flexible CIGS solar cell on a PI substrate with the best conversion efficiency of 6.38% is demonstrated (active area 0.16cm2).
机译:通过X射线衍射光谱(XRD)研究了在400℃以下聚酰亚胺(PI)衬底上通过一阶段和三阶段共蒸发工艺生长的多晶Cu(In,Ga)Se2薄膜的电学和结构特性。扫描电子显微镜(SEM)和霍尔效应测量。如XRD光谱所示,一步法制得的化学计量CIGS膜表现出(In0.68Ga0.32)2Se3和Cu(In0.7Ga0.3)的特征衍射峰)2 Se。从SEM图像中发现,薄膜结构比三阶段工艺膜显示出更多的柱状和致密性。三阶段工艺获得的化学计量CIGS膜显示(In0.68Ga0)第二相共存。 32)2Se3,Cu2-xSe和Cu(In0.7Ga0.3)2Se。这种膜还观察到高净载流子浓度和薄层电导率,与Cu2-xSe相的存在有关。 CIGS薄膜的生长温度低于400℃,三阶段工艺效率低下用于太阳能电池的nt。通过使用一级共蒸发工艺,展示了PI基板上的柔性CIGS太阳能电池,其最佳转换效率为6.38%(有效面积为0.16cm2​​)。

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  • 来源
    《中国物理快报:英文版》 |2008年第2期|734-736|共3页
  • 作者单位

    Key Laboratory of Opto-Electronic Information Science and Technology Ministry of Education,Key Laboratory of Photo-Electronics Thin Film Devices and Techniques of Tianjin,Institute of Photo-Electronic Thin film Device and Technology,Nankai University,Tian;

    Key Laboratory of Opto-Electronic Information Science and Technology Ministry of Education,Key Laboratory of Photo-Electronics Thin Film Devices and Techniques of Tianjin,Institute of Photo-Electronic Thin film Device and Technology,Nankai University,Tian;

    Key Laboratory of Opto-Electronic Information Science and Technology Ministry of Education,Key Laboratory of Photo-Electronics Thin Film Devices and Techniques of Tianjin,Institute of Photo-Electronic Thin film Device and Technology,Nankai University,Tian;

    Key Laboratory of Opto-Electronic Information Science and Technology Ministry of Education,Key Laboratory of Photo-Electronics Thin Film Devices and Techniques of Tianjin,Institute of Photo-Electronic Thin film Device and Technology,Nankai University,Tian;

    Key Laboratory of Opto-Electronic Information Science and Technology Ministry of Education,Key Laboratory of Photo-Electronics Thin Film Devices and Techniques of Tianjin,Institute of Photo-Electronic Thin film Device and Technology,Nankai University,Tian;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 物理学;
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