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Improved Performance of Pentacene Organic Field-Effect Transistors by Inserting a V2O5 Metal Oxide Layer

机译:通过插入V2O5金属氧化物层改善并五苯有机场效应晶体管的性能

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We fabricate pentacene-based organic field effect transistors(OFETs),inserting a transition metal oxide(V2 O5)layer between the pentacene and Al source-drain(S/D)electrodes.The performance of the devices with V2O5/AlS/D electrodes is considerably improved compared to the pentacene-based OFET with only Al S/D electrodes.After the 10-nm V2O5 layer modification,the effective field-effect mobility of the devices increases from 2.7 ×10-3 cm2 /V.s to 8.93 × 10-1 cm2 /V.s.Owing to the change of the injection property,the effective threshold voltage (Vth)is changed from-7.5 V to-5 V and the on/off ratio shifts from 102 to 104.Moreover,the dispersion of sub-threshold current in the devices disappears.These performance improvements are ascribed to the low carrier injection barrier and the reduction of contact resistance.It is indicated that V2O5 layer modification is an effective approach to improve pentacene-based OFET performance.%We fabricate pentacene-based organic field effect transistors (OFETs), inserting a transition metal oxide (V2O5) layer between the pentacene and Al source-drain (S/D) electrodes. The performance of the devices with V2 O5/AI S/D electrodes is considerably improved compared to the pentacene-based OFET with only Al S/D electrodes. After the 10-nm V2O5 layer modification, the effective field-effect mobility of the devices increases from 2.7 x 10~3 cm2/V-s to 8.93x10-1 cm2/V-s. Owing to the change of the injection property, the effective threshold voltage (Vth) is changed from -7.5 V to -5 V and the on/off ratio shifts from l02 to 104. Moreover, the dispersion of sub-threshold current in the devices disappears. These performance improvements are ascribed to the low carrier injection barrier and the reduction of contact resistance. It is indicated that V2O5 layer modification is an effective approach to improve pentacene-based OFET performance.
机译:我们制造了并五苯有机场效应晶体管(OFET),在并五苯和Al源漏(S / D)电极之间插入了过渡金属氧化物(V2 O5)层。具有V2O5 / AlS / D电极的器件的性能与仅使用Al S / D电极的并五苯基OFET相比,它有了很大的改进。对10nm V2O5层进行改性后,器件的有效场效应迁移率从2.7×10-3 cm2 / Vs增加到了8.93×10 -1 cm2 / Vs由于注入特性的变化,有效阈值电压(Vth)从-7.5 V变为-5 V,开/关比从102变为104。器件中的阈值电流消失了。这些性能的提高归因于低载流子注入势垒和接触电阻的降低。表明V2O5层的改性是提高并五苯基OFET性能的有效方法。%我们制造并五苯基有机场效应晶体管( OFETs),在并五苯和Al源漏(S / D)电极之间插入过渡金属氧化物(V2O5)层。与仅具有Al S / D电极的并五苯基OFET相比,具有V2 O5 / AI S / D电极的设备的性能得到了显着改善。修改10nm V2O5层后,器件的有效场效应迁移率从2.7 x 10〜3 cm2 / V-s增加到8.93x10-1 cm2 / V-s。由于注入特性的变化,有效阈值电压(Vth)从-7.5 V变为-5 V,并且开/关比也从102变为104。此外,器件中的亚阈值电流的分散性消失了。这些性能的提高归因于低载流子注入势垒和接触电阻的降低。研究表明,V2O5层改性是提高并五苯基OFET性能的有效方法。

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