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Transparent Conductive Al-Doped ZnO/Cu Bilayer Films Grown on Polymer Substrates at Room Temperature

机译:室温下在聚合物基底上生长的透明导电掺杂Al的ZnO / Cu双层薄膜

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摘要

Al-doped ZnO (AZO)/Cu bi-layer films are deposited by dc magnetron sputtering on polycarbonate substrates at room temperature. The structural, electrical and optical properties of the films are investigated at various sputtering powers of the Cu layer. The AZO/Cu bi-layer film deposited at a moderate sputtering power of 180 W for the Cu layer displayed the highest figure of merit of 3.47 x 10~3 Ω-1, with a low sheet resistance of12.38Ω/sq, an acceptable visible transmittance of 73%, and a high near-infrared reflectance of about 50%.%Al-doped ZnO(AZO)/Cu bi-layer films are deposited by dc magnetron sputtering on polycarbonate substrates at room temperature.The structural,electrical and optical properties of the films are investigated at various sputtering powers of the Cu layer.The AZO/Cu bi-layer film deposited at a moderate sputtering power of 180 W for the Cu layer displayed the highest figure of merit of 3.47 × 10-3 Ω-1,with a low sheet resistance of 12.38Ω/sq,an acceptable visible transmittance of 73%,and a high near-infrared reflectance of about 50%.
机译:在室温下,通过直流磁控溅射在铝基板上沉积掺铝的ZnO(AZO)/ Cu双层薄膜。在铜层的各种溅射功率下研究了膜的结构,电学和光学性质。以180 W的中等溅射功率沉积的Cu层AZO / Cu双层膜的最高品质因数为3.47 x 10〜3Ω-1,薄层电阻为12.38Ω/ sq,可以接受在室温下,通过直流磁控溅射在聚碳酸酯基板上沉积了73%的可见光透射率和约50%的高近红外反射率.Al掺杂的ZnO(AZO)/ Cu双层薄膜沉积在聚碳酸酯基板上。在铜层的各种溅射功率下研究了薄膜的光学特性。以180 W的中等溅射功率沉积的Cu层AZO / Cu双层薄膜的最高品质因数为3.47×10-3Ω -1,薄层电阻为12.38Ω/ sq,可见光透射率为73%,近红外反射率约为50%。

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