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Comparative Study of the Characteristics of the Basal Plane Stacking Faults of Nonpolar a-Plane and Semipolar (11(2)2) GaN

机译:非极性a平面和半极性(11(2)2)GaN的基面堆叠故障特性的比较研究

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摘要

Nonpolar (11-20) and semipolar (11222) GaN are grown on r-plane and m-plane sapphire by MOCVD to investigate the characteristics of basal plane stacking faults (BSFs). Transmission electron microscopy reveals that the density of BSFs for the semipolar (11-22) and nonpolar a-plane GaN template is 3×105cm-1 and 8×10 cm'1, respectively. The semipolar (11-22) GaN shows an arrowhead-like structure, and the nonpolar a-plane GaN has a much smoother morphology with a streak along the c-axis. Both nonpolar (11-20) and semipolar (11-22) GaN have very strong BSF luminescence due to the optically active character of the BSFs.%Nonpolar (11(2)0) and semipolar (11(2)2) GaN are grown on r-plane and m-plane sapphire by MOCVD to investigate the characteristics of basal plane stacking faults (BSFs).Transmission electron microscopy reveals that the density of BSFs for the semipolar (11(2)2) and nonpolar a-plane GaN template is 3x105 cm-1 and 8×105 cm-1,respectively.The semipolar (11(2)2) GaN shows an arrowhead-like structure,and the nonpolar a-plane GaN has a much smoother morphology with a streak along the c-axis.Both nonpolar (11(2)0) and semipolar (11(2)2) GaN have very strong BSF luminescence due to the optically active character of the BSFs.
机译:NonPolar(11-20)和半极(11222)GaN在R平面和M平面蓝宝石上通过MOCVD生长,以研究基础平面堆叠故障(BSF)的特性。透射电子显微镜揭示了半极(11-22)和非极性A平面GaN模板的BSF的密度分别为3×105cm-1和8×10cm'1。 Semipolar(11-22)GaN显示箭头状结构,并且非极性A平面GaN具有沿C轴的条纹具有更光滑的形态。由于BSF的光学活性特征,非极性(11-20)和半极(11-22)GaN具有非常强烈的BSF发光。%非极化(11(2)0)和半极(11(2)2)GaN是MOCVD在R平面和M平面蓝宝石上生长,以研究基底平面堆叠故障(BSF)的特性。传播电子显微镜显示,Semipolar的BSFS密度(11(2)2)和非极性A平面GaN模板分别是3x105 cm-1和8×105cm-1。Semipolar(11(2)2)GaN显示箭头状结构,并且非极性A-Plane GaN具有沿着条纹的更顺畅的形态C-AXIS.BOTH NONPOLAR(11(2)0)和半极(11(2)2)GaN具有非常强大的BSF发光,由于BSF的光学活性特征。

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  • 来源
    《中国物理快报:英文版》 |2012年第1期|254-256|共3页
  • 作者单位

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
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