首页> 中文期刊> 《中国物理快报:英文版》 >Germanium PMOSFETs with Low-Temperature Si2H6 Passivation Featuring High Hole Mobility and Superior Negative Bias Temperature Instability

Germanium PMOSFETs with Low-Temperature Si2H6 Passivation Featuring High Hole Mobility and Superior Negative Bias Temperature Instability

         

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  • 来源
    《中国物理快报:英文版》 |2014年第5期|191-194|共4页
  • 作者单位

    Key Laboratory of Optoelectronic Technology and Systems of the Ministry of Education,College of Optoelectronic Engineering, Chongqing University, Chongqing 400044;

    Key Laboratory of Optoelectronic Technology and Systems of the Ministry of Education,College of Optoelectronic Engineering, Chongqing University, Chongqing 400044;

    Key Laboratory of Optoelectronic Technology and Systems of the Ministry of Education,College of Optoelectronic Engineering, Chongqing University, Chongqing 400044;

    Key Laboratory of Optoelectronic Technology and Systems of the Ministry of Education,College of Optoelectronic Engineering, Chongqing University, Chongqing 400044;

    Wide Bandgap Semiconductor Technology Disciplines State Key Laboratory, School of Microelectronics,Xidian University, Xi'an 710071;

    Wide Bandgap Semiconductor Technology Disciplines State Key Laboratory, School of Microelectronics,Xidian University, Xi'an 710071;

    Wide Bandgap Semiconductor Technology Disciplines State Key Laboratory, School of Microelectronics,Xidian University, Xi'an 710071;

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  • 正文语种 eng
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