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Highly Sensitive Detection of Deoxyribonucleic Acid Hybridization Using Au-Gated AlInN/GaN High Electron Mobility Transistor-Based Sensors

机译:使用金门控的基于AlInN / GaN高电子迁移率晶体管的传感器高灵敏地检测脱氧核糖核酸杂交

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摘要

Gallium nitride-(GaN) based high electron mobility transistors (HEMTs) provide a good platform for biological detection.In this work,both Au-gated AlInN/GaN HEMT and AlGaN/GaN HEMT biosensors are fabricated for the detection of deoxyribonucleic acid (DNA) hybridization.The Au-gated AlInN/GaN HEMT biosensor exhibits higher sensitivity in comparison with the AlGaN/GaN HEMT biosensor.For the former,the drain-source current (VDs =0.5 V) shows a clear decrease of 69μA upon the introduction of 1 μmolL-1 (μM) complimentary DNA to the probe DNA at the sensor area,while for the latter it is only 38μA.This current reduction is a notable indication of the hybridization.The high sensitivity can be attributed to the thinner barrier of the AlInN/GaN heterostructure,which makes the two-dimensional electron gas channel more susceptible to a slight change of the surface charge.
机译:基于氮化镓(GaN)的高电子迁移率晶体管(HEMT)提供了一个良好的生物检测平台。在这项工作中,制造了金化的AlInN / GaN HEMT和AlGaN / GaN HEMT生物传感器用于检测脱氧核糖核酸(DNA)与AlGaN / GaN HEMT生物传感器相比,Au门控的AlInN / GaN HEMT生物传感器显示出更高的灵敏度。传感器区域的探针DNA与探针DNA有1μmolL-1(μM)互补DNA,而后者仅为38μA。这种电流降低是杂交的显着指示。高灵敏度可归因于探针的壁垒更薄。 AlInN / GaN异质结构,使二维电子气通道更容易受到表面电荷的轻微变化的影响。

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  • 来源
    《中国物理快报:英文版》 |2017年第4期|75-78|共4页
  • 作者单位

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Beijing 100083;

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    Department of Electro-mechanics, Handan College, Handan 056005;

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    School of Microelectronics, University of Chinese Academy of Sciences, Beijing 100049;

    Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Beijing 100083;

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Beijing 100083;

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Beijing 100083;

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    School of Microelectronics, University of Chinese Academy of Sciences, Beijing 100049;

    Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Beijing 100083;

    Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083;

    School of Microelectronics, University of Chinese Academy of Sciences, Beijing 100049;

    Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Beijing 100083;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
  • 原文格式 PDF
  • 正文语种 eng
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