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Influences of increasing gate stem height on DC and RF performances of InAlAs/InGaAs InP-based HEMTs

机译:增加闸门杆高度对InAlas / Ingaas INP的近距离的DC和RF性能的影响

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  • 来源
    《中国物理:英文版》 |2021年第1期|667-674|共8页
  • 作者单位

    High-Frequency High-Voltage Device and Integrated Circuits Center Institute of Microelectronics Chinese Academy of Sciences Beijing 100029 China;

    University of Chinese Academic of Sciences Beijing 100049 China;

    High-Frequency High-Voltage Device and Integrated Circuits Center Institute of Microelectronics Chinese Academy of Sciences Beijing 100029 China;

    University of Chinese Academic of Sciences Beijing 100049 China;

    High-Frequency High-Voltage Device and Integrated Circuits Center Institute of Microelectronics Chinese Academy of Sciences Beijing 100029 China;

    University of Chinese Academic of Sciences Beijing 100049 China;

    High-Frequency High-Voltage Device and Integrated Circuits Center Institute of Microelectronics Chinese Academy of Sciences Beijing 100029 China;

    High-Frequency High-Voltage Device and Integrated Circuits Center Institute of Microelectronics Chinese Academy of Sciences Beijing 100029 China;

    University of Chinese Academic of Sciences Beijing 100049 China;

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